Orientation-controlled self-assembled nanolithography using a polystyrene-polydimethylsiloxane block copolymer.

关键词: Self-assembly 、 Polydimethylsiloxane 、 Optoelectronics 、 Plasma etching 、 Nanolithography 、 Materials science 、 Silicon 、 Copolymer 、 Mineralogy 、 Polystyrene 、 Reactive-ion etching

摘要: Templated self-assembly of a cylinder-forming poly(styrene-b-dimethylsiloxane) (PS−PDMS) diblock copolymer has been investigated for nanolithography applications. The large χ-…