Sparse-exposure technique in holographic two-photon polymerization
作者： Hidetomo Takahashi , Satoshi Hasegawa , Akihiro Takita , Yoshio Hayasaki
DOI: 10.1364/OE.16.016592
关键词: Irradiation 、 Femtosecond 、 Fabrication 、 Spatial frequency 、 Two-photon excitation microscopy 、 Laser 、 Liquid-crystal display 、 Optics 、 Optoelectronics 、 Holography 、 Materials science
摘要: Holographic two-photon polymerization is based on a high-speed, low-loss parallel laser irradiation technique inside photosensitive materials using computer-generated hologram displayed liquid crystal spatial light modulator. We demonstrated sparse exposure combining and scanning to improve the fabrication throughput achieve simultaneous of linear structures with different widths. also space-variant by changing CGH, as well voxel single femtosecond pulse irradiation.
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