Characterization of Nb-doped Pb(Zr,Ti)O3 films deposited on stainless steel and silicon substrates by RF-magnetron sputtering for MEMS applications

作者: Takamichi Fujii , Yoshikazu Hishinuma , Tsuyoshi Mita , Takayuki Naono

DOI: 10.1016/J.SNA.2010.08.019

关键词: Materials scienceSiliconMetallurgyThin filmSputteringComposite materialPiezoelectricityWaferSubstrate (electronics)Microelectromechanical systemsSputter deposition

摘要: … for Pb loss during film formation. The ratio of Zr to Ti was set to be 0.52:0.48 which is MPB ratio. Additionally, 12% Nb was added in order to improve the piezoelectric properties. An RF …

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