Simple method to measure the etching rate of monocrystalline silicon in KOH solution

作者: Cheng Chen , Liang Jiang , Peng Zhang , Hongbo Wang , Linmao Qian

DOI: 10.1049/MNL.2017.0628

关键词: Monocrystalline siliconComposite materialEtching rateSiliconEtching (microfabrication)OxideLayer (electronics)Atomic force microscopyMaterials scienceMicrosphere

摘要: … Therefore, the selective etching of silicon in KOH solution … oxide that naturally forms on silicon surface acts as mask film, … on the silicon substrate surface generates selective etching of …

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