作者: Kanesh Kumar Jayapalan , Oi Hoong Chin , Chiow San Wong
DOI: 10.1007/978-981-10-4217-1_10
关键词: Planar 、 Inductively coupled plasma atomic emission spectroscopy 、 Plasma 、 Inductively coupled plasma 、 Radio frequency 、 Computational physics 、 Hysteresis 、 Power Balance 、 Electromagnetic field 、 Materials science
摘要: This chapter examines some of the key fundamentals planar radio frequency inductively coupled plasmas (or RF ICPs) including various modes operation, hysteresis between modes, power balance plasma operating states and dynamics source electromagnetic fields in presence plasma. These properties are discussed with demonstration several theoretical models. The characteristics effects neutral gas heating, as well technique measurement temperature also presented. is concluded a discussion on applications ICPs their development throughout years.