Radio Frequency Planar Inductively Coupled Plasma: Fundamentals and Applications

作者: Kanesh Kumar Jayapalan , Oi Hoong Chin , Chiow San Wong

DOI: 10.1007/978-981-10-4217-1_10

关键词: PlanarInductively coupled plasma atomic emission spectroscopyPlasmaInductively coupled plasmaRadio frequencyComputational physicsHysteresisPower BalanceElectromagnetic fieldMaterials science

摘要: This chapter examines some of the key fundamentals planar radio frequency inductively coupled plasmas (or RF ICPs) including various modes operation, hysteresis between modes, power balance plasma operating states and dynamics source electromagnetic fields in presence plasma. These properties are discussed with demonstration several theoretical models. The characteristics effects neutral gas heating, as well technique measurement temperature also presented. is concluded a discussion on applications ICPs their development throughout years.

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