Pattern characterisation method
作者： Romain Feilleux , Johann Foucher
DOI:
关键词: Set (abstract data type) 、 Instrumentation 、 Geometry 、 Dimensionless quantity 、 Sampling interval 、 Mathematics 、 Image (mathematics) 、 Basis (linear algebra) 、 Point (geometry)
摘要: A method of characterizing a pattern includes determining an image the contour to be characterized with imagining instrumentation; processing image, including plurality points located along and sampled according given sampling interval; for each point, identifying point on reference corresponding same interval number dimensionless intermediate coefficient representative deviation between contour; final basis set coefficients points, being contour.
lens.org 参考文章(6)
Hiroshi Makihira, Takashi Hiroi, Hitoshi Kubota, Shunji Maeda, Pattern checking method and checking apparatus ,(1992)
Asahiro Kuni, Chie Shishido, Hiroshi Miyai, Takashi Hiroi, Masahiro Watanabe, Maki Tanaka, Aritoshi Sugimoto, Yasuhiko Nara, Pattern inspection method and apparatus ,(2007)
Sanjay Nichani, William M. Silver, Adam Wagman, E. John McGarry, Method for fast, robust, multi-dimensional pattern recognition ,(2004)
Yong-Ju Kim, Kwang-Sik Kim, Method and apparatus for aligning a substrate and for inspecting a pattern on a substrate ,(2005)
Hidetoshi Morokuma, Ryoichi Matsuoka, Tomofumi Nishiura, Atsushi Miyamoto, Sem system and a method for producing a recipe for imaging or measuring a specimen by using the sem system ,(2007)
Takayoshi Fujii, Yusaku Konno, Mitsutoshi Watabiki, Yuichiro Yamazaki, Yusuke Iida, Naotada Okada, Makoto Kaneko, Shinichi Imai, Pattern inspection apparatus and pattern inspection method ,(2011)