Control and broadband monitoring of transparent multilayer thin films deposited by magnetron sputtering
作者： A. Voronov , S.A. Atarah
DOI: 10.1016/J.SURFCOAT.2018.05.004
关键词: Sputtering 、 Materials science 、 Process (computing) 、 Process control 、 Optoelectronics 、 Broadband 、 Deposition process 、 Sputter deposition 、 Thin film
摘要: Abstract A multilayer thin film deposition system has been developed that implements broadband process control and monitoring. Running on a simple algorithm, the stringently controls thickness of each multilayers thereby avoiding error build up throughout process. The which also monitoring capability can be implemented any platform. Antireflection coatings deposited by new yielded spectral characteristics commercial standards.
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