Plasma focus radiation source

摘要: This invention relates to a plasma focus source for generating radiation at selected wavelength, the involving producing high energy sheathe which moves down an electrode column speed and is pinched end of form very temperature spot. An ionizable gas introduced pinch can produce desired wavelength. In order prevent separation from pinch, therefore prolong potentially damaging restrike, shield nonconducting material positioned distance center shaped redirect electrode, preventing thereof. opening provided in permit pass substantially unimpeded.