Apparatus for optical beam shaping and associated methods
作者： Matthew E. Hansen
DOI:
关键词: Surface finish 、 Isotropic etching 、 Ion milling machine 、 Orientation (geometry) 、 Cross section (physics) 、 Optics 、 Plasma etching 、 Optical path 、 Materials science 、 Aspect ratio (image)
摘要: This invention relates to an apparatus for optical beam shaping and diffusing, a method making the apparatus, using apparatus. The comprises crystalline material object shaped fit within train with pattern of surface texture along path. Surface removal processes are applied portion made form at that object. depends upon: (1) identity (2) orientation crystal lattice axes respect where is be formed. Processes include, but not limited to, mechanical grinding, ablating, chemical etching, plasma ion milling, combinations thereof. arrangement can refined by coupling lithographic patterning methods any processes. used change one or more of: shape, orientation, (3) aspect ratio, (4) angular pupil distribution, (5) intensity profile cross section beam.
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