Sputtering of thin and intermediately thick films of solid deuterium by keV electrons
作者： W. Svendsen , B. Thestrup , J. Schou , O. Ellegaard
DOI: 10.1016/0168-583X(95)00300-2
关键词: Deuterium 、 Atomic physics 、 Electron 、 Materials science 、 Yield (engineering) 、 Sputtering 、 Electron bombardment 、 Range (particle radiation)
摘要: Abstract Sputtering of films solid deuterium by keV electrons was studied in a cryogenic set-up. The sputtering yield shows minimum about 4 D 2 /electron for 1.5 and at thickness slightly larger than the average projected range electrons. We suggest that around represents value closest to bulk-yield induced electron bombardment. It may also include contributions from mechanisms enhance thin very thick films.
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