Two-Photon Diffraction and Quantum Lithography
作者： Milena D'Angelo , Maria V. Chekhova , Yanhua Shih
DOI: 10.1103/PHYSREVLETT.87.013602
关键词: NOON state 、 Quantum lithography 、 Quantum limit 、 Quantum simulator 、 Quantum electrodynamics 、 Quantum mechanics 、 Quantum imaging 、 Physics 、 Quantum sensor 、 Quantum technology 、 Open quantum system
摘要: We report a proof-of-principle experimental demonstration of quantum lithography. Utilizing the entangled nature of a two-photon state, the experimental results have beaten the classical diffraction limit by a factor of 2. This is a quantum mechanical two-photon phenomenon but not a violation of the uncertainty principle.
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