Pulsed laser deposition apparatus for applied research

摘要: In this paper, we describe the apparatus for pulsed laser deposition of thin solid films that have developed in our laboratories Trento University. Our is original many its adopted technical solutions: (i) substrate-manipulator mechanism possesses four degrees freedom, x, y and z translation a rotation, which permits one to treat samples with non-planar geometry; (ii) an independent target-handling moves circular target calculated speed profiles uniform ablation surface be obtained (normally, uses beam-bending simple at constant velocity); (iii) maximum substrate dimensions can relatively large, about 85 mm × mm, and, case approximately cylindrical symmetry, by exploiting mm.