作者: M. Capitelli , R. Celiberto , M. Cacciatore
DOI: 10.1016/S1049-250X(08)60040-3
关键词: Atmospheric pressure 、 Physics 、 Non-equilibrium thermodynamics 、 Plasma 、 Electric discharge in gases 、 Plasma etching 、 Ionization 、 Distribution function 、 Atomic physics 、 Ion
摘要: Plasma chemistry is a quite new discipline, widely utilized in the last few years for different technological applications. started its life many ago with use of electrical arcs oxidation nitrogen to NO. Its continued on phenomenological basis: only recently has it achieved position true science by mixing methodologies stemming from both and physics. It practically impossible quote all applications plasma chemistry: first approximation we can distinguish carried out under equilibrium conditions nonequilibrium ones. In case one thermodynamics estimating chemical composition medium study concepts derived kinetic theory gases transport properties medium. This approach been discussed several papers applies plasmas continuously running at atmospheric pressure. On other hand, these years, large effort devoted understanding conditions, i.e., which electron energy distribution functions (eedf) are not Maxwellian, distributions among internal degrees freedom molecules non-Boltzmann. Thesemore » typically met technology (plasma etching, deposition, treatment materials), gas discharge lasers (IR excimer lasers), production neutral negative ion beams, ecology destruction pollutants, general those molecular component plays an essential role. 177 refs., 18 figs., 1 tab.« less