STM Studies of Adsorbates in the Monolayer Range: Ag/Ni(100) and O/Ni(100)

作者: A. Brodde , G. Wilhelmi , H. Neddermeyer

DOI: 10.1007/978-3-642-84810-0_7

关键词: Layer (electronics)CrystallographyScanning tunneling microscopeMonolayerChemistryEpitaxyMonatomic gasMisorientationSubstrate (electronics)Non-blocking I/O

摘要: We have measured Ni(100) in its clean state and the systems Ag/Ni(100) 0/Ni(100) monolayer coverage range by using STM, LEED AES. The STM images from very often show a complicated terrace structure due to general monoatomic steps, which is related misorientation of surface against (100) bulk imperfections. For an atomic corrugation less than 0. 1 A was found. Ag deposition at room temperature we observe submonolayer network connected islands height, whose shape can surprisingly well be explained diffusion-limited aggregation. step edges are preferential sites for formation nuclei. Two domains identified on consistent with c(2x8) reconstruction visible LEED. system p(2x2) c(2x2) local structures depending preparation conditions O exposure. At also found features, assign NiO kind epitaxial layer has been obtained 0 exposures 5000 L substrate 270 °C. In appears as fairly rough typical 50 A. It consists smaller islands, ordered arrangement along high-symmetry directions but do not exhibit distinct structure.

参考文章(17)
Th. Berghaus, A. Brodde, H. Neddermeyer, St. Tosch, Scanning tunneling microscopy on Si(112) Surface Science. ,vol. 184, pp. 273- 288 ,(1987) , 10.1016/S0039-6028(87)80285-6
W.‐D. Wang, N. J. Wu, P. A. Thiel, Structural steps to oxidation of Ni(100) Journal of Chemical Physics. ,vol. 92, pp. 2025- 2035 ,(1990) , 10.1063/1.458036
A. P. Shapiro, T. C. Hsieh, A. L. Wachs, T. Miller, T.-C. Chiang, Band dispersions of Ag(111) monolayers on various substrates Physical Review B. ,vol. 38, pp. 7394- 7407 ,(1988) , 10.1103/PHYSREVB.38.7394
R. Franchy, M. Wuttig, H. Ibach, New aspects of the disordered adsorption of oxygen on Ni(100) Surface Science Letters. ,vol. 215, pp. 65- 73 ,(1989) , 10.1016/0039-6028(89)90700-0
St. Tosch, H. Neddermeyer, Nucleation and growth of Cu and Ag on Si(111)7×7 Journal of Microscopy. ,vol. 152, pp. 415- 422 ,(1870) , 10.1111/J.1365-2818.1988.TB01403.X
K. Hono, T. Iwata, H.W. Pickering, T. Sakurai, A field ion microscopy study of nickel oxide Surface Science. ,vol. 209, ,(1989) , 10.1016/0167-2584(89)90588-4
T. A. Witten, L. M. Sander, Diffusion-limited aggregation Physical Review B. ,vol. 27, pp. 5686- 5697 ,(1983) , 10.1103/PHYSREVB.27.5686
J. Wintterlin, J. Wiechers, H. Brune, T. Gritsch, H. Höfer, R. J. Behm, Atomic-resolution imaging of close-packed metal surfaces by scanning tunneling microscopy. Physical Review Letters. ,vol. 62, pp. 59- 62 ,(1989) , 10.1103/PHYSREVLETT.62.59
H. Neddermeyer, STM studies of nucleation and the initial stages of film growth Critical Reviews in Solid State and Materials Sciences. ,vol. 16, pp. 309- 335 ,(1990) , 10.1080/10408439008242185
R. S. Saiki, A. P. Kaduwela, J. Osterwalder, C. S. Fadley, C. R. Brundle, Observation and characterization of a strained lateral superlattice in the oxidation of Ni(001) Physical Review B. ,vol. 40, pp. 1586- 1592 ,(1989) , 10.1103/PHYSREVB.40.1586