作者: A. Brodde , G. Wilhelmi , H. Neddermeyer
DOI: 10.1007/978-3-642-84810-0_7
关键词: Layer (electronics) 、 Crystallography 、 Scanning tunneling microscope 、 Monolayer 、 Chemistry 、 Epitaxy 、 Monatomic gas 、 Misorientation 、 Substrate (electronics) 、 Non-blocking I/O
摘要: We have measured Ni(100) in its clean state and the systems Ag/Ni(100) 0/Ni(100) monolayer coverage range by using STM, LEED AES. The STM images from very often show a complicated terrace structure due to general monoatomic steps, which is related misorientation of surface against (100) bulk imperfections. For an atomic corrugation less than 0. 1 A was found. Ag deposition at room temperature we observe submonolayer network connected islands height, whose shape can surprisingly well be explained diffusion-limited aggregation. step edges are preferential sites for formation nuclei. Two domains identified on consistent with c(2x8) reconstruction visible LEED. system p(2x2) c(2x2) local structures depending preparation conditions O exposure. At also found features, assign NiO kind epitaxial layer has been obtained 0 exposures 5000 L substrate 270 °C. In appears as fairly rough typical 50 A. It consists smaller islands, ordered arrangement along high-symmetry directions but do not exhibit distinct structure.