作者: Akhil Rajan , Kaycee Underwood , Federico Mazzola , Philip D. C. King
DOI: 10.1103/PHYSREVMATERIALS.4.014003
关键词: Chemical physics 、 Materials science 、 van der Waals force 、 Monolayer 、 Transition metal 、 Semiconductor 、 Molecular beam epitaxy 、 Epitaxy 、 Chalcogen 、 Fabrication
摘要: To advance fundamental understanding, and ultimate application, of transition-metal dichalcogenide (TMD) monolayers, it is essential to develop capabilities for the synthesis high-quality single-layer samples. Molecular beam epitaxy (MBE), a leading technique fabrication highest-quality epitaxial films conventional semiconductors has, however, typically yielded only small grain sizes sub-optimal morphologies when applied van der Waals growth monolayer TMDs. Here, we present systematic study on influence adatom mobility, rate, metal:chalcogen flux NbSe2, VSe2 TiSe2 using MBE. Through this, identify key drivers kinetics that control TMDs, realising four distinct as-grown compounds. We use this determine optimised conditions ultimately largest TMDs have been achieved date via MBE growth.