Morphology Control of Epitaxial Monolayer Transition Metal Dichalcogenides

作者: Akhil Rajan , Kaycee Underwood , Federico Mazzola , Philip D. C. King

DOI: 10.1103/PHYSREVMATERIALS.4.014003

关键词: Chemical physicsMaterials sciencevan der Waals forceMonolayerTransition metalSemiconductorMolecular beam epitaxyEpitaxyChalcogenFabrication

摘要: To advance fundamental understanding, and ultimate application, of transition-metal dichalcogenide (TMD) monolayers, it is essential to develop capabilities for the synthesis high-quality single-layer samples. Molecular beam epitaxy (MBE), a leading technique fabrication highest-quality epitaxial films conventional semiconductors has, however, typically yielded only small grain sizes sub-optimal morphologies when applied van der Waals growth monolayer TMDs. Here, we present systematic study on influence adatom mobility, rate, metal:chalcogen flux NbSe2, VSe2 TiSe2 using MBE. Through this, identify key drivers kinetics that control TMDs, realising four distinct as-grown compounds. We use this determine optimised conditions ultimately largest TMDs have been achieved date via MBE growth.

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