作者: Jae P. Lee , Hee K. Kim , Chan R. Park , Gyoosoon Park , Hyon T. Kwak
DOI: 10.1021/JP030077K
关键词: Chemical engineering 、 Titanium isopropoxide 、 Octadecyltrichlorosilane 、 Monolayer 、 Self-assembled monolayer 、 X-ray photoelectron spectroscopy 、 Titanium oxide 、 Photocatalysis 、 Inorganic chemistry 、 Contact angle 、 Materials science
摘要: The photocatalytic decomposition of octadecyltrichlorosilane (OTS) based self-assembled monolayer formed on TiO2 has been studied using atomic force microscopy(AFM), X-ray photoelectron spectroscopy (XPS), and contact angle analysis. thin films were grown Si(100) substrates by layer deposition from titanium isopropoxide water. Densely packed alkylsiloxane monolayers similar in quality to those SiO2 are TiO2. It is found that the decomposed much faster than under UV irradiation 254 nm air. OTS-based SAMs through oxidation alkyl chains with a gradual homogeneous reduction chain length. After complete photodecomposition OTS−SAMs, siloxane headgroups remain surface. observation indicates oxide, well-known photocatalyst for organic pollutant treatment, efficiently decomposes irradiation...