Fabrication of nanostructures with long-range order using block copolymer lithography
作者： J. Y. Cheng , C. A. Ross , E. L. Thomas , Henry I. Smith , G. J. Vancso
DOI: 10.1063/1.1519356
关键词: Photolithography 、 Lithography 、 Spin coating 、 Etching (microfabrication) 、 Nanotechnology 、 Nanostructure 、 Spin casting 、 Nanolithography 、 Copolymer 、 Materials science
摘要: … Three different gratings with 50 nm step height were used in this work: a … with 500 nm groove width, a 440 nm period grating with 320 nm grove width, and a 440 nm period grating with …
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