Investigating phosphonate monolayer stability on ALD oxide surfaces
作者： Brittany Branch , Manish Dubey , Aaron S. Anderson , Kateryna Artyushkova , J. Kevin Baldwin
DOI: 10.1016/J.APSUSC.2013.09.128
关键词: Self-assembled monolayer 、 Phosphonate 、 Silane 、 X-ray photoelectron spectroscopy 、 Octadecylphosphonic acid 、 Octadecyltrichlorosilane 、 Monolayer 、 Atomic layer deposition 、 Inorganic chemistry 、 Chemistry
摘要: Abstract We report a series of studies aimed at investigating the stability phosphonate self-assembled monolayers (SAMs) made from octadecylphosphonic acid (ODPA) or perfluorinated phosphonic (PFPA) on hafnium and aluminum oxide surfaces deposited by atomic layer deposition (ALD). The were techniques including self-assembly solution, tethering aggregation growth, Langmuir–Blodgett (LB) method. SAMs prepared LB method primarily used in our investigations because they found to be most uniform reproducible. All films ALD oxide-coated substrates characterized means water contact angle measurements, spectroscopic ellipsometry, X-ray photoelectron spectroscopy (XPS) force microscopy (AFM). XPS data conclusively showed covalent formation both substrates. formed Al 2 O 3 HfO stable upon exposure water. PFPA studied here either phosphate buffer (PBS) room temperature. also show that similar silane-based octadecyltrichlorosilane (OTS) silicon (SiO ) are less PBS than These suggest should considered for use (bio)molecular sensing actuator devices utilize require longer-term under aqueous conditions.
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