A Soft Lithography Approach to the Fabrication of Nanostructures of Single Crystalline Silicon with Well‐Defined Dimensions and Shapes

作者： Y. Yin , B. Gates , Y. Xia

DOI: 10.1002/1521-4095(200010)12:19<1426::AID-ADMA1426>3.0.CO;2-B

关键词: Resist 、 Materials science 、 X-ray lithography 、 Photolithography 、 Soft lithography 、 Nanotechnology 、 Crystalline silicon 、 Next-generation lithography 、 Multilayer soft lithography 、 Hybrid silicon laser