Correlation between the density of TiO2 films and their properties
作者： C.R Ottermann , K Bange
DOI: 10.1016/S0040-6090(96)08848-7
关键词: Materials science 、 Chemical vapor deposition 、 Analytical chemistry 、 Crystallography 、 Crystallization 、 Ion plating 、 Grain size 、 Annealing (metallurgy) 、 Amorphous solid 、 Anatase 、 Spin coating
摘要: Stress, density and refractive index of approximate 100 nm thick titania films are determined for layers deposited on fused silica substrates by reactive evaporation (RE), ion plating (IP), plasma impulse chemical vapour deposition (PICVD) spin coating (SC). Relative densities (ϱfilmϱana) vary between 0.7 1.0 with respect to the crystal phase anatase (ϱana = 3.84 g cm−3). The depends linearly density. Film stress is tensile at low compressive order anatase. A strong correlation found be independent from conditions structure as-deposited films. transition amorphous caused annealing induces an increase in stress. film correlated crystallization temperature, size during grain size.
elsevier.com
sci-hub.se 参考文章(9)
Martin Hüppauff, Klaus Bange, Bruno Lengeler, Density, thickness and interface roughness of SiO2, TiO2 and Ta2O5 films on BK-7 glasses analyzed by x-ray reflection Thin Solid Films. ,vol. 230, pp. 191- 198 ,(1993) , 10.1016/0040-6090(93)90514-P
C. R. Ottermann, K. Bange, W. Wagner, M. Laube, F. Rauch, Correlation of hydrogen content with properties of oxidic thin films Surface and Interface Analysis. ,vol. 19, pp. 435- 438 ,(1992) , 10.1002/SIA.740190181
R Thielsch, W Meiling, E Göring, Structural, optical and electronical properties of mixed dielectric films Vacuum. ,vol. 41, pp. 1147- 1150 ,(1990) , 10.1016/0042-207X(90)93894-O
Z. L. Wu, K. Bange, Comparative photothermal study of reactive low-voltage ion-plated and electron-beam-evaporated TiO 2 thin films Applied Optics. ,vol. 33, pp. 7901- 7907 ,(1994) , 10.1364/AO.33.007901
J. Segner, Plasma impulse chemical vapour deposition—a novel technique for the production of high power laser mirrors☆ Materials Science and Engineering A-structural Materials Properties Microstructure and Processing. ,vol. 140, pp. 733- 740 ,(1991) , 10.1016/0921-5093(91)90505-H
Lawrence R. Doolittle, Algorithms for the rapid simulation of Rutherford backscattering spectra Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. ,vol. 9, pp. 344- 351 ,(1985) , 10.1016/0168-583X(85)90762-1
M. Laube, F. Rauch, C. Ottermann, O. Anderson, K. Bange, Density of thin TiO2 films Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms. ,vol. 113, pp. 288- 292 ,(1996) , 10.1016/0168-583X(95)01331-8
W. Wagner, F. Rauch, K. Bange, Concentration profiles of hydrogen in technical oxidic thin films and multilayer systems Fresenius Journal of Analytical Chemistry. ,vol. 333, pp. 478- 480 ,(1989) , 10.1007/BF00572357
H. Windischmann, Intrinsic stress in sputtered thin films Journal of Vacuum Science and Technology. ,vol. 9, pp. 2431- 2436 ,(1991) , 10.1116/1.577295