Powered shield source for high density plasma
作者： Liubo Hong
DOI:
关键词: Shield 、 Electromagnetic coil 、 Plasma 、 Electrical engineering 、 Optoelectronics 、 High density 、 Sputtering 、 Materials science 、 Vacuum chamber
摘要: An insulative inter-turn shield positioned at the channel in coil windings to confine plasma generated by energy radiated an apparatus for sputtering material onto a workpiece. The can prevent escape of through between thereby improve effectiveness process. In addition, also block passage sputtered channel, preventing contamination vacuum chamber.
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