Characterization of plasma-nitrided iron by XRD, SEM and XPS
作者： L.C. Gontijo , R. Machado , E.J. Miola , L.C. Casteletti , P.A.P. Nascente
DOI: 10.1016/J.SURFCOAT.2003.06.026
关键词: Nitriding 、 Rietveld refinement 、 Materials science 、 Analytical chemistry 、 Scanning electron microscope 、 X-ray photoelectron spectroscopy 、 Glow discharge 、 X-ray crystallography 、 Iron nitride 、 Thin film
摘要: Abstract The plasma nitriding technique has been used to improve the tribological and mechanical properties of materials, especially iron-based alloys. In this work, pulsed glow discharge (PGD) was for pure iron. Three samples were nitrided in a gas mixture 80 vol.% H 2 20 N under pressure 400 Pa, frequency 9 kHz, temperature 580 °C. Samples A, B C 30 min, 60 min 90 respectively. iron characterized by scanning electron microscopy (SEM), energy-dispersive X-ray spectrometry (EDS), diffraction (XRD) photoelectron spectroscopy (XPS). SEM micrographs showed differences surface morphologies among samples. XRD identified γ′-Fe 4 e-Fe 2–3 phases all Rietveld analysis performed order investigate concentration variations as function time. XPS employed obtain chemical-state semi-quantitative information, revealed thin film Fe O 3 covering layer formed on top layers.
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