rf Glow Discharge Cleaning in the DITE Tokamak

作者: J. Burt , S. J. Fielding , G. M. McCracken , G. Mezey , D. D. R. Summers†

DOI: 10.13182/FST84-A23212

关键词: Atmospheric pressureSiliconMethaneAnalytical chemistryAtomic physicsHydrogenGlow dischargeCarbonMaterials scienceImpurityFusion power

摘要: An R.F. assisted glow discharge cleaning system has been used on the DITE tokamak to remove low z impurities. Rapid of was achieved without baking following a major rebuild vacuum and subsequent exposures atmospheric pressure. Discharge with both pure hydrogen 1% added methane used. However ultimate impurity level could not be reduced below that corresponding Z /sub eff/ = 2. Clean single crystal silicon samples were exposed in discharges. Analysis these by RBS showed there high deposition rates carbon, oxygen metals plus

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