Comparison of in-situ low-pressure oxidation of pure iron at room temperature in O2 and in O2/H2O mixtures using XPS
作者： V. Stambouli , C. Palacio , H.J. Mathieu , D. Landolt
DOI: 10.1016/0169-4332(93)90435-E
关键词: Adsorption 、 In situ 、 Analytical chemistry 、 X-ray photoelectron spectroscopy 、 Oxide 、 Oxygene 、 Chemistry 、 Oxygen 、 Torr 、 Layer (electronics)
摘要: Abstract Low-pressure (10 -6 -10 -8 Torr) in-situ oxidation of Fe by O 2 and plus H at room temperature has been studied X-ray photoelectron spectroscopy. Non-linear least-squares fitting routines are applied to determine the thin oxide film composition. For exposures from 1 10 4 L pure iron leads a 3 layer on top FeO. No or little FeOOH formation is observed. Some OH - adsorbed surface. Exposure mixture + (50/50) does not influence composition film.
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