作者: Arup Neogi , Christopher L Littler , Yuankun Lin , Usha Philipose , A J Syllaios
关键词: Materials science 、 Substrate (chemistry) 、 Molybdenum disulfide 、 Monolayer 、 Phase (matter) 、 Partial pressure 、 Nucleation 、 Analytical chemistry 、 Alkali metal 、 Raman spectroscopy
摘要: Though the positive role of alkali halides in realizing large area growth transition metal dichalcogenide layers has been validated, film-growth kinematics not yet fully established. This work presents a systematic analysis MoS2morphology for films grown under various pre-treatment conditions substrate with sodium chloride (NaCl). At an optimum NaCl concentration, domain size monolayer increased by almost two orders magnitude compared to alkali-free MoS2. The results show inverse relationship between fractal dimension and areal coverage monolayers multi-layers, respectively. Using Fact-Sage software, determining partial pressures Mo- S-based compounds gaseous phase at temperature is elucidated. presence salts shown affect film morphology affecting Mo S pressures. Compared synthesis same conditions, MoS2film assisted ≈ 81% covered monolayers. Under ideal nucleation was suppressed, domains enlarged, resulting MoS2monolayers. No evidence or halogen atoms were found composition films. On basis Raman spectroscopy photoluminescence measurements, MoS2films be good crystalline quality.