Method and apparatus for thermally treating substrates
作者： Markus Hauf , Christoph Striebel
DOI:
关键词: Pyrometer 、 Particle detector 、 Radiation 、 Wavelength 、 Materials science 、 Optics 、 Temperature measurement 、 Substrate (electronics) 、 Optoelectronics
摘要: The object of the disclosure is to measure temperature using pyrometers, in a simple and economic way, enabling precise measurement, even for low temperatures. presents an apparatus method thermally treating substrates, wherein substrate exposed at least first second radiation; predetermined wavelengths radiation are absorbed between source substrate; from measured wavelength detector arranged on same side as source; modulated determined.
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