Growth of fullerene-like carbon nitride thin solid films by reactive magnetron sputtering; role of low-energy ion irradiation in determining microstructure and mechanical properties

摘要: Fullerene-like (FL) carbon nitride (CNx) films were deposited on Si (100) substrates by dc reactive, unbalanced, magnetron sputtering in a N2/Ar mixture from high-purity pyrolythic graphite cathode dual-magnetron system with coupled magnetic fields. The N2 fraction the discharge gas (0%–100%) and substrate bias (−25 V; −40 V) was varied, while total pressure (0.4 Pa) temperature (450 °C) kept constant. configuration of magnetrons resulted reduced ion flux density, leading to much lower average energy per incorporated particle, due less focused plasma as compared single magnetron. This enabled evolution pronounced FL microstructure. nitrogen concentration saturated rapidly at 14–18 at. %, determined elastic recoil analysis, minor dependence conditions. No correlations detected between photoelectron N1s core level spectra different microstructures, observed high-res...