作者: Brian W. Karr , I. Petrov , David G. Cahill , J. E. Greene
DOI: 10.1063/1.118675
关键词: Metallurgy 、 Microstructure 、 Transmission electron microscopy 、 Sputter deposition 、 Thin film 、 Scanning tunneling microscope 、 Sputtering 、 Tin 、 Single crystal 、 Analytical chemistry 、 Materials science
摘要: The evolution of surface morphology and microstructure during growth single crystal TiN(001) is characterized by in situ scanning tunneling microscopy postdeposition plan-view transmission electron microscopy. TiN layers are grown on MgO at 650