The influence of deposition temperature on microstructure and corrosion resistance of ZrOxNy/ZrO2 coatings deposited using RF sputtering
作者： GI Cubillos , M Bethencourt , JJ Olaya , JE Alfonso , JF Marco
DOI: 10.1016/J.APSUSC.2014.04.215
关键词: Microstructure 、 Crystallite 、 Metallurgy 、 Scanning electron microscope 、 Composite material 、 Corrosion 、 X-ray photoelectron spectroscopy 、 Thin film 、 Materials science 、 Zirconium 、 Sputtering
摘要: Abstract This paper reports the influence of substrate temperature on structure, morphology and corrosion resistance ZrOxNy/ZrO2 thin films deposited 304 stainless steel using radio frequency sputtering (RF sputtering). Structural analysis was carried out by X-ray diffraction (XRD); morphological performed scanning electron microscopy (SEM) atomic force (AFM) surface chemical determined photoelectron spectroscopy (XPS). XRD data showed that at 300 °C (573 K) 350 °C (623 K) result in growth a monoclinic zirconium oxynitride phase with preferential orientation along (−1 1 1) plane, while 14 °C (287 K) predominant is polycrystalline ZrO2. The results indicate coatings provide good to chloride-containing media, being better film (623 K). SEM demonstrated homogeneity three temperatures; AFM studies established average roughness be 4.25 nm. binding energies Zr 3d, N 1s, O 1s core levels XPS were all compatible formation oxide film. are promising candidates for increasing steels chloride-rich environments.
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