Substrates for mirrors for euv lithography and their production
作者： Michael Gerhard , Julian Kaller , Wilfried Clauss
DOI:
关键词: Optoelectronics 、 Thermal 、 Range (particle radiation) 、 Extreme ultraviolet lithography 、 Temperature difference 、 Materials science 、 Mixing (process engineering) 、 Substrate (electronics) 、 Thermal expansion 、 Optics
摘要: For the production of mirrors for EUV lithography, substrates are suggested having a mean relative thermal longitudinal expansion no more than 10 ppb across temperature difference ΔT 15° C. and zero-crossing in range between 20° 40° this purpose, at least one first second material low coefficients opposite gradients as function selected substrate is produced by mixing bonding these materials.
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