Removal of surface contaminants by irradiation.
作者： Joseph A. Dehais , Audrey C. Engelsberg
DOI:
关键词: Irradiation 、 Continuous wave 、 Contamination 、 Planar 、 Materials science 、 Surface (mathematics) 、 Analytical chemistry 、 Chemical engineering 、 Substrate (printing)
摘要: An apparatus for removing surface contaminants from a planar or irregularly shaped of substrate (12, 70) by high-energy irradiation is provided. The invention enables removal without altering the underlying molecular crystal structure 70). source includes pulsed continuous wave laser (14) lamp (59).
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