Method of cleaning plasma applicator in situ and plasma applicator employing the same

作者: Ki-Young Yun , Il-kyoung Kim , No-Hyun Huh , Jeong-soo Suh , Wan-Goo Hwang

DOI:

关键词: PlasmaMaterials scienceIn situChemical engineeringAnalytical chemistry

摘要: A method of cleaning a plasma generating area applicator in situ is disclosed and comprises; supplying by-product gas to the area, from area.

参考文章(2)
Etsuo Wani, Yoshihide Kosano, Naoto Tsuji, Koji Shibata, Hitoshi Murata, Method of cleaning cvd device and cleaning device therefor ,(2002)