作者: Ki-Young Yun , Il-kyoung Kim , No-Hyun Huh , Jeong-soo Suh , Wan-Goo Hwang
DOI:
关键词: Plasma 、 Materials science 、 In situ 、 Chemical engineering 、 Analytical chemistry
摘要: A method of cleaning a plasma generating area applicator in situ is disclosed and comprises; supplying by-product gas to the area, from area.