Effect of reactive gases in an atmospheric-pressure plasma for dye adsorption on ZnO nanorods
作者： De Pham-Cong , Kyun Ahn , Jong-Man Kim , Se-Young Jeong , Chae-Ryong Cho
DOI: 10.3938/JKPS.60.1052
关键词: Surface energy 、 Substrate (chemistry) 、 Nanorod 、 Radical 、 Chemical bath deposition 、 Atmospheric-pressure plasma 、 Chemical bond 、 Layer (electronics) 、 Materials science 、 Chemical engineering
摘要: In this study, ZnO nanorods (NRs) were grown on F-doped SnO2 (FTO)/glass substrate by using a chemical bath deposition (CBD) method. The NRs crystallized well. surfaces of the modified an atmospheric-pressure (AP) plasma containing reactive gases such as O2, H2, and N2. case Ar/O2 Ar/N2 plasma-treated NRs, bonding states dye adsorption surface layer increased because -O -OH radicals. We present efficiencies ZnO-NR-based dye-sensitized solar cells (DSSCs) treated with AP plasmas gases.
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