Localized electro-reduction of p-type Cu2O by SECM under light irradiation
作者： Jin-He Zhou , Ji-Peng Zhao , Lian-Kui Wu , Ji-Ming Hu
DOI: 10.1016/J.ELECOM.2016.10.002
关键词: Materials science 、 Scanning electrochemical microscopy 、 Scanning ion-conductance microscopy 、 Spectroscopy 、 Semiconductor 、 Optoelectronics 、 Photoelectrochemistry 、 Scanning electron microscope 、 Nanoparticle 、 Substrate (electronics) 、 Analytical chemistry
摘要: Abstract This work reports a novel approach to patterning copper nanoparticles on Cu 2 O substrate by photo-electroreduction reaction with the aid of scanning electrochemical microscopy in direct mode. The concept is based localized cathodic current flux produced when applying both negative potentials and light irradiation p-type semiconductors. patterns can be tuned modifying deposition potential, duration time illumination intensity, have been characterized electron microscopy, energy-dispersive X-ray analysis micro-Raman spectroscopy.
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