Electron Beam Lithography
作者： Christophe Constancias , Stefan Landis , Serdar Manakli , Luc Martin , Laurent Pain
DOI: 10.1002/9781118557662.CH3
关键词: Monte Carlo method 、 Electron-beam lithography 、 Optics 、 Materials science 、 Inelastic collision 、 Optoelectronics
摘要:
sci-hub.se 参考文章(19)
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