Directionality of sputtered Cu atoms in a hollow cathode enhanced planar magnetron

摘要: Angular distributions of sputteredCu atoms in a planar magnetron discharge have been measured using directional quartz microbalance. The discharge, both Ar and Kr gases, was enhanced at low pressures, e.g., 0.07 Pa, hollow cathodeelectron source. Several means improving the directionality, i.e., decreasing angular spread sputtered atoms, were investigated. Increasing voltage to 770 V increasing gas pressure not more than 1 Pa (for throw distance 50 mm) marginally improved directionality distribution. Significant achieved filter collimators which consisted an array collimating tubes. Our measurements show that absence scattering collisions effect can be described by geometric shadowing. A Cucathode with holes machined into surface shown high voltages current densities. We develop simple model trajectories ions approaching cathode explain dependence distribution on conditions radial position.