The influence of atomic layer deposition process temperature on ZnO thin film structure
作者： P Boryło , K Matus , K Lukaszkowicz , J Kubacki , K Balin
DOI: 10.1016/J.APSUSC.2018.03.169
关键词: Substrate (electronics) 、 Thin film 、 Deposition (phase transition) 、 Atomic layer deposition 、 Nanostructure 、 Layer (electronics) 、 Composite material 、 Materials science 、 Transmission electron microscopy 、 X-ray photoelectron spectroscopy
摘要: Abstract The comprehensive investigation results of the influence ZnO thin films deposition parameters on their structure, mechanical and optical properties are presented in paper. Zinc oxide layers were prepared using atomic layer (ALD) method. For evaluation morphology structure films, both scanning transmission electron microscopy was used. Transparency test carried out UV/VIS spectroscopy. concentration particular elements calculated from XPS measurements. Chemical analysis extended to measurements micro nanostructure with use TOF-SIMS spectrometry. Oliver-Pharr method used measure instrumental hardness, while scratch performed study adhesion surface. uniform investigated coatings without any visible delamination observed. Despite very low thickness, demonstrated a good substrate. showed that temperature ALD process significantly affects transparency films. number cycles is also crucial regarding transparency.
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sci-hub.se 参考文章(22)
Wei Liu, Shuying Cheng, Photoelectric properties of ITO thin films deposited by DC magnetron sputtering Journal of Semiconductors. ,vol. 32, pp. 013002- ,(2011) , 10.1088/1674-4926/32/1/013002
Winfried Hoffmann, Thomas Pellkofer, Thin films in photovoltaics: Technologies and perspectives Thin Solid Films. ,vol. 520, pp. 4094- 4100 ,(2012) , 10.1016/J.TSF.2011.04.146
Konstantinos Kotsis, Volker Staemmler, Ab initio calculations of the O1s XPS spectra of ZnO and Zn oxo compounds Physical Chemistry Chemical Physics. ,vol. 8, pp. 1490- 1498 ,(2006) , 10.1039/B515699H
Martin Schreyer, Liangfeng Guo, Satyanarayana Thirunahari, Feng Gao, Marc Garland, Simultaneous determination of several crystal structures from powder mixtures: the combination of powder X-ray diffraction, band-target entropy minimization and Rietveld methods Journal of Applied Crystallography. ,vol. 47, pp. 659- 667 ,(2014) , 10.1107/S1600576714003379
Koichi Momma, Fujio Izumi, VESTA 3 for three-dimensional visualization of crystal, volumetric and morphology data Journal of Applied Crystallography. ,vol. 44, pp. 1272- 1276 ,(2011) , 10.1107/S0021889811038970
Swee-Yong Pung, Kwang-Leong Choy, Xianghui Hou, Chongxin Shan, Preferential growth of ZnO thin films by the atomic layer deposition technique Nanotechnology. ,vol. 19, pp. 435609- ,(2008) , 10.1088/0957-4484/19/43/435609
Krzysztof Lukaszkowicz, Leszek A. Dobrzanski, Grzegorz Kokot, Pawel Ostachowski, Characterization and properties of PVD coatings applied to extrusion dies Vacuum. ,vol. 86, pp. 2082- 2088 ,(2012) , 10.1016/J.VACUUM.2012.04.025
Semyung Kwon, Seokhwan Bang, Seungjun Lee, Sunyeol Jeon, Wooho Jeong, Hyungchul Kim, Su Cheol Gong, Ho Jung Chang, Hyung-ho Park, Hyeongtag Jeon, Characteristics of the ZnO thin film transistor by atomic layer deposition at various temperatures Semiconductor Science and Technology. ,vol. 24, pp. 035015- ,(2009) , 10.1088/0268-1242/24/3/035015
A. Illiberi, F. Roozeboom, P. Poodt, Spatial atomic layer deposition of zinc oxide thin films ACS Applied Materials & Interfaces. ,vol. 4, pp. 268- 272 ,(2012) , 10.1021/AM2013097
Zs Baji, Zoltán Lábadi, Gy Molnár, Béla Pécz, K Vad, Zsolt Endre Horváth, PJ Szabó, T Nagata, J Volk, None, Highly conductive epitaxial ZnO layers deposited by atomic layer deposition Thin Solid Films. ,vol. 562, pp. 485- 489 ,(2014) , 10.1016/J.TSF.2014.04.047