Innovative Technologies for Maskless Lithography and Non-Conventional Patterning

摘要: Abstract : Collaborative research was conducted by the faculty known as Lithography Network. This network brings together world class researchers over a broad set of technology areas essential to success maskless lithography and non-conventional patterning. The primary task is listed below: Task 1: Electron Beam Technology for Maskless Lithography, Professor R. Fabian Pease (Coordinator); 2: Spatial Light Modulators lithography, Olav Solgaard Andrew Neureuther; 3: Droplet-On-Demand (DoD) Systems. Vivek Subramanian (Coordinator), Jeffrey Bokhor; 4: Advanced Materials C. Grant Willson Jean Frechet; 5: Characterization Nanoscale Phenomena Neureuther 6: Data Compression Path Issues Avideh Zakhor (Coordinator).