Effect of substrate rotation on domain structure and magnetic relaxation in magnetic antidot lattice arrays

摘要: Microdimensional triangular magnetic antidot lattice arrays were prepared by varying the speed of substrate rotation. The pre-deposition patterning has been performed using photolithography technique followed a post-deposition lift-off. Surface morphology taken atomic force microscopy depicted that growth mechanism grains changes from chain like formation to island structures due Study magnetization reversal via magneto optic Kerr effect based revealed reduction uniaxial anisotropy and increase in domain size with relaxation measured under constant field becomes faster rotation during deposition. nature for non-rotating sample can be described double exponential decay. However, is well either or Fatuzzo-Labrune single decay, which increases applied field.