Deep-UV Microlithography
作者： David J. Elliott
DOI: 10.1016/B978-0-12-237070-0.50012-1
关键词: Reticle 、 Lithography 、 Optics 、 Wafer 、 Semiconductor device fabrication 、 Integrated circuit 、 Excimer laser 、 Materials science 、 Laser 、 Stepper
摘要: Deep- ultraviolet (UV) lithography represents a highly specialized application of excimer lasers, primary light source for imaging VLSI reticle patterns onto photoresist-coated silicon wafers advanced integrated circuit (IC) fabrication. The laser is in high resolution optical projection aligner, the wafer stepper. Deep-UV steppers are used volume production density memory, microprocessors, and bipolar metal-oxide-semiconductor (MOS) logic circuits. This chapter discusses evolution deep-UV resulting sub-half-micron stepper; technical requirements lithographic technology applied to manufacturing; stepper functions specifications; line-narrowed design, spectral narrowing, stabilization; use maintenance utilities. IC fabrication, lithography, has undergone progress since invention transistor. Optics wavelengths must be purity transmissive region interest.
sci-hub.st 参考文章(68)
Hideharu Nobutoki, Teruhiko Kumada, Hiroshi Koezuka, Molecular Design of Dissolution Inhibitor in Chemical Amplification Resist System by Molecular Orbital Method: Transparency and Reactivities with “Protons” Japanese Journal of Applied Physics. ,vol. 34, pp. 623- 629 ,(1995) , 10.1143/JJAP.34.623
En-Shinn Wu, James H. Strickler, W. R. Harrell, Watt W. Webb, Two-photon lithography for microelectronic application Optical/Laser Microlithography V. ,vol. 1674, pp. 776- 782 ,(1992) , 10.1117/12.130367
Matthias Bolle, Sylvain Lazare, Monique Le Blanc, Aloyse Wilmes, Submicron periodic structures produced on polymer surfaces with polarized excimer laser ultraviolet radiation Applied Physics Letters. ,vol. 60, pp. 674- 676 ,(1992) , 10.1063/1.106588
R. Heydel, R. Matz, W. Göpel, Maskless excimer laser induced projection patterning of InP in Cl2 etch gas Applied Surface Science. ,vol. 69, pp. 38- 45 ,(1993) , 10.1016/0169-4332(93)90479-U
Mariana Sendova, Hiroyuki Hiraoka, Sub-Half-Micron Periodic Structures on Polymer Surfaces with Polarized Laser Irradiation Japanese Journal of Applied Physics. ,vol. 32, pp. 6182- 6184 ,(1993) , 10.1143/JJAP.32.6182
M. R. Perrone, C. Palma, A. Piegari, D. Flori, V. Bagini, S. Scaglione, Theoretical and experimental determination of single round-trip beam parameters in a Xe–Cl laser Journal of the Optical Society of America A. ,vol. 12, pp. 991- 998 ,(1995) , 10.1364/JOSAA.12.000991
S. Proyer, E. Stangl, P. Schwab, D. B�uerle, P. Simon, C. Jordan, Patterning of YBCO films by excimer-laser ablation Applied Physics A. ,vol. 58, pp. 471- 474 ,(1994) , 10.1007/BF00332439
Ulrich C. Boettiger, Thomas Fischer, Andreas Grassmann, Holger Moritz, Aerial image analysis of quarter-micrometer patterns on a 0.5-NA excimer stepper SPIE's 1994 Symposium on Microlithography. ,vol. 2197, pp. 402- 411 ,(1994) , 10.1117/12.175434
F. Foulon, M. Green, Laser projection-patterned etching of (100) GaAs by gaseous HCl and CH3Cl Applied Physics A. ,vol. 60, pp. 377- 381 ,(1995) , 10.1007/BF01538337
R. Leuschner, H. Borndörfer, E. Kühn, M. Sebald, R. Sezi, M. Byer, Ch. Nölscher, Progress in deep-UV resists using CARL technology Polymer Engineering and Science. ,vol. 32, pp. 1558- 1564 ,(1992) , 10.1002/PEN.760322103