Transport properties of Al or Cr-doped nickel oxide relevant to the thermal oxidation of dilute Ni-Al and Ni-Cr alloys

作者: Z. Halem , N. Halem , M. Abrudeanu , S. Chekroude , C. Petot

DOI: 10.1016/J.SSI.2016.09.023

关键词: Cr dopedNickel oxideAtmospheric temperature rangeThermal oxidationKinetic energyCrystallographic defectDiffusionInorganic chemistryMaterials scienceElectrical resistivity and conductivity

摘要: Abstract In the present study we have analysed thermal oxidation of Ni and dilute ( 1 − x O single crystals. temperature range 900°–1200 °C, Al 3 + or Cr additions decrease rates crystals in their stability range, due to kinetic demixing cations. At T outer layer mobility 2 + when amount decreases O.

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