Vapour deposition method for fabricating lithium-containing thin film layered structures

作者: Christopher Edward Lee , Kyle James Hutchings , Laura Mary Perkins , Alexandros Anastasopoulos , Brian Elliott Hayden

DOI:

关键词: Chemical engineeringLithiumInorganic chemistryAmorphous solidSubstrate (printing)Thin filmTransition metalMaterials scienceAtmospheric temperature rangeOxideLayer (electronics)

摘要: A vapour deposition method for preparing a multi-layered thin film structure comprises providing source of each component element compound intended first layer and second layer, wherein the sources comprise at least lithium, oxygen, or one more glass-forming elements, transition metals; heating substrate to temperature; co-depositing elements from oxygen metals onto heated react on form crystalline lithium-containing metal oxide compound; temperature within range substantially 170° C. less an amorphous oxynitride compound.

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