作者: Christopher Edward Lee , Kyle James Hutchings , Laura Mary Perkins , Alexandros Anastasopoulos , Brian Elliott Hayden
DOI:
关键词: Chemical engineering 、 Lithium 、 Inorganic chemistry 、 Amorphous solid 、 Substrate (printing) 、 Thin film 、 Transition metal 、 Materials science 、 Atmospheric temperature range 、 Oxide 、 Layer (electronics)
摘要: A vapour deposition method for preparing a multi-layered thin film structure comprises providing source of each component element compound intended first layer and second layer, wherein the sources comprise at least lithium, oxygen, or one more glass-forming elements, transition metals; heating substrate to temperature; co-depositing elements from oxygen metals onto heated react on form crystalline lithium-containing metal oxide compound; temperature within range substantially 170° C. less an amorphous oxynitride compound.