Substrate processing chamber

摘要: A chemical vapor deposition (CVD) chamber includes a body which defines enclosure, and pedestal mounted in the adapted to support substrate during processing. Also included processing are lifters lift from pedestal, an edge ring shield of and/or pumping cover exhaust channel enclosure plate is be raised by actuator. The contacts lifter raise lifter, also has extension that extends upwardly plate. raises simultaneously with actuation lifter.