Effect of Target Density on the Surface Morphology of Y-Ba-Cu-O Thin Films Prepared by Ionized Jet Deposition

摘要: Ionized jet deposition (IJD) is a pulse electron method. It can be used for the preparation of thin films from wide spectrum materials on different substrates. The main benefits IJD are high flexibility and possibility to change many parameters. Some them even during such as acceleration voltage, working gas, substrate temperature, etc. variability parameters allows finding ideal conditions almost any material. This method has great potential cost-effective scale-up HTS (High-temperature Superconductors) tapes fabrication. research focused study influence target density microstructure deposited YBCO layers. an important role in morphology films. In this work, were fixed (except density). distance between was 110 mm temperatures set 650 °C. targets samples examined by scanning microscopy (SEM), energy dispersive spectroscopy (EDS), LED Confocal profilometer. Nine with densities 3.8 g·cm−3 5.6 prepared total. All single batch precursor powder at ambient atmosphere sintering times.