Method for doping impurities
作者： Stanislav Ivanovich Soloviev , Zachary Matthew Stum , Greg Thomas Dunne , Jesse Berkley Tucker
DOI:
关键词: Chemical engineering 、 Heat treating 、 Analytical chemistry 、 Impurity 、 Dopant 、 Materials science 、 Layer (electronics) 、 Doping 、 Carbonization
摘要: A method for doping impurities into a device layer is provided. The includes providing carbonized dopant over layer, wherein the comprises one or more impurities, and heat treating to thermally diffuse layer.
lens.org 参考文章(13)
W Aubrey, Method for processing iron ore concentrates ,(1972)
Roger N. Kust, Hydrometallurgical brass dust reclamation ,(1978)
Gary Allen West, Jeffrey Peter Donlan, Arunava Gupta, Stable suspensions of boron, phosphorus, antimony and arsenic dopants ,(1984)
Jussi K. Rastas, Lars-Goran Bjorkqvist, Simo S. Liukkonen, Raija-Leena Gisler, Process for the recovery of zinc, copper and cadmium in the leaching of zinc calcine ,(1978)
R. Donald Bartusiak, John D. Lynn, Wet-classifying method for recovery of carbon and iron-bearing particles ,(1982)
Jörg Horzel, Johan Nijs, Mia Honoré, Jozef Szlufcik, Semiconductor device with selectively diffused regions ,(2003)
Akio Machida, Takahiro Kamei, Yoshiyuki Kawana, Method for doping impurities, methods for producing semiconductor device and applied electronic apparatus ,(2005)
Mark C. Hakey, Steven J. Holmes, Toshiharu Furukawa, Donald W. Rakowski, Patricia M. Marmillion, David V. Horak, William H-L Ma, Methods using disposable and permanent films for diffusion and implantation doping ,(2002)
Stanislav Soloviev, Tangali S. Sudarshan, Ying Gao, System and method for fabricating diodes ,(2004)