The influence of the cathode surface on the movement of magnetically driven electric arcs

作者: R N Szente , R J Munz , M G Drouet

DOI: 10.1088/0022-3727/23/9/009

关键词: Kelvin probe force microscopeCathodic arc depositionElectric arcArgonChemistryVacuum arcPlasma arc weldingAtomic physicsCathodeArc (geometry)Optics

摘要: The arc movement was examined for tubular copper electrodes using different plasma gases (argon, helium, nitrogen, air, chloride and mixtures of these gases). normal current 100 A; the moved an external magnetic field which varied between 10 1500 G. velocity followed aerodynamic type equation when cathode surface contaminated. For clean or heavily contaminated surfaces another opposing force becomes important, drag force. also investigated by high speed filming following fluctuations. Auger, ESCA SEM; work function values were obtained a Kelvin probe. results consistent with model presented movement.

参考文章(16)
R. J. Noer, Ph. Niedermann, N. Sankarraman, O/. Fischer, Electron field emission from intentionally introduced particles on extended niobium surfaces Journal of Applied Physics. ,vol. 59, pp. 3851- 3860 ,(1986) , 10.1063/1.336727
A.E. Guile, K.A. Naylor, Further correlation of experimental data for electric arcs in transverse magnetic fields Proceedings of the Institution of Electrical Engineers. ,vol. 115, pp. 1349- 1354 ,(1967) , 10.1049/PIEE.1968.0238
R N Szente, R J Munz, M G Drouet, Arc velocity and cathode erosion rate in a magnetically driven arc burning in nitrogen Journal of Physics D. ,vol. 21, pp. 909- 913 ,(1988) , 10.1088/0022-3727/21/6/008
R. N. Szente, R. J. Munz, M. G. Drouet, Cathode erosion in inert gases: The importance of electrode contamination Plasma Chemistry and Plasma Processing. ,vol. 9, pp. 121- 132 ,(1989) , 10.1007/BF01015830
R. N. Szente, R. J. Munz, M. G. Drouet, The effect of low concentrations of a polyatomic gas in argon on erosion on copper cathodes in a magnetically rotated arc Plasma Chemistry and Plasma Processing. ,vol. 7, pp. 349- 364 ,(1987) , 10.1007/BF01016522
G. N. A. van Veen, T. Baller, J. Dieleman, A. E. de Vries, Summary Abstract: Nanosecond ultraviolet laser induced etching of Si and Cu exposed to Cl2 Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 5, pp. 1606- 1607 ,(1987) , 10.1116/1.574574
H. Gerischer, D.M. Kolb, M. Przasnyski, Chemisorption of metal atoms on metal surfaces in correlation to work function differences Surface Science. ,vol. 43, pp. 662- 666 ,(1974) , 10.1016/0039-6028(74)90286-6
J. M. Burkstrand, G. G. Kleiman, G. G. Tibbetts, J. C. Tracy, Study of the N–Cu(100) system Journal of Vacuum Science and Technology. ,vol. 13, pp. 291- 295 ,(1976) , 10.1116/1.568830
Deborah R. Porto, C. W. Kimblin, D. T. Tuma, Experimental observations of cathode‐spot surface phenomena in the transition from a vacuum metal‐vapor arc to a nitrogen arc Journal of Applied Physics. ,vol. 53, pp. 4740- 4749 ,(1982) , 10.1063/1.331302