Sub-bandgap spectral photo-response analysis of Ti supersaturated Si

作者: Eric García-Hemme , Rodrigo García-Hernansanz , J Olea , D Pastor , A Del Prado

DOI: 10.1063/1.4766171

关键词: Materials scienceMetal–insulator transitionSupersaturationPulsed laser depositionBand gapSiliconElectrical resistivity and conductivityConductancePhotoconductivityAnalytical chemistry

摘要: We have analyzed the increase of sheet conductance (ΔG□) under spectral illumination in high dose Ti implanted Si samples subsequently processed by pulsed-laser melting. Samples with concentration clearly above insulator-metal transition limit show a remarkably ΔG□, even higher than that measured silicon reference sample. This ΔG□ magnitude is contrary to classic understanding recombination centers action and supports lifetime recovery predicted for concentrations deep levels transition.

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