XPS study of the band alignment at ITO/oxide (n-type MoO3 or p-type NiO) interface

作者: J. C. Bernède , S. Houari , D. Nguyen , P. Y. Jouan , A. Khelil

DOI: 10.1002/PSSA.201127428

关键词: Kelvin probe force microscopeNon-blocking I/OMaterials scienceHeterojunctionNanotechnologyOptoelectronicsX-ray photoelectron spectroscopyElectronic band structureOxideSemiconductorAnode

摘要: … 3 is n-type, its band structure is still under study. Here, the band alignment at the interface of an ITO… used to measure the band offsets allows us to estimate the band discontinuities at the …

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