Organic removal process
作者： Steven L. Nelson , Lawrence E. Carter
DOI:
关键词: Scientific method 、 Materials science 、 Photoresist 、 Aluminium 、 Improved method 、 Ozone 、 Substrate (printing) 、 Inorganic chemistry 、 Copper
摘要: An improved method of photoresist removal is disclosed in which a treating solution ozone and bicarbonate or other suitable radical scavengers used to treat substrate for use an electronic device. The particularly well suited where certain metals such as aluminum, copper oxides thereof are present on the surface substrate. also organic materials well.
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