Energy stabilized gas discharge laser
作者： Wolfgang Zschocke , Igor Bragin , Uwe Stamm
DOI:
关键词: Analytical chemistry 、 Excimer 、 Overshoot (microwave communication) 、 Beam (structure) 、 Laser pumping 、 Electric discharge in gases 、 Xenon 、 Photolithography 、 Chemistry 、 Laser
摘要: An excimer or molecular fluorine laser, such as a KrF- ArF-laser, (F2) particularly for photolithography applications, has gas mixture including trace amount of additive. The concentration the additive in is optimized improving energy stability and/or overshoot control laser output beam. further determined and adjusted at new fills during operation based on its effect pulse view constraints aging discharge circuit other components system. Attenuation also provided increasing lifetimes system by controlling over time. A specific preferred xenon more than 100 ppm control. may be equipped with an internal supply unit supply, generator supplying from condensed matter xenon.
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